This website requires certain cookies to work and uses other cookies to help you have the best experience. By visiting this website, certain cookies have already been set, which you may delete and block. By closing this message or continuing to use our site, you agree to the use of cookies. Visit our updated privacy and cookie policy to learn more.
This Website Uses Cookies By closing this message or continuing to use our site, you agree to our cookie policy. Learn MoreThis website requires certain cookies to work and uses other cookies to help you have the best experience. By visiting this website, certain cookies have already been set, which you may delete and block. By closing this message or continuing to use our site, you agree to the use of cookies. Visit our updated privacy and cookie policy to learn more.
Home » Nikon's SITECH Group Introduces the NRM-3000 07.15.2002
Nikon's most advanced overlay measurement system available now to the U.S. market.
Nikon's Semiconductor Inspection Technologies Group (SITECH) introduced their most advanced overlay measurement system to the U.S. market. The NRM-3000 combines Nikon's superior optics, advanced technology and immense experience in semiconductor photolithography to provide automatic measurement of overlay and NSR focus marks with the highest-speeds and exceptional precision.
The NRM system, which delivered stellar performance in the Japanese and Asian markets, features a high-precision, dedicated optical system with exceptional aberration management. The Nikon objective lens is designed specifically for overlay measurement and offers unsurpassed imaging performance with an exceptional high S/N ratio and high dynamic range characteristics.